First-Principles Investigation on the Impact of Electric Fields on the Electronic Properties of Monolayer SiS and SiS₂ for Nanoelectronic Applications

Authors

  • Vu Khac Hung Faculty of Technology and Engineering, Thai Binh University, Hung Yen, Vietnam. Author
  • Duong Thi Loan Faculty of Technology and Engineering, Thai Binh University, Hung Yen, Vietnam. Author
  • Le Nhat Bang Faculty of Technology and Engineering, Thai Binh University, Hung Yen, Vietnam. Author

DOI:

https://doi.org/10.66566/ijmir/2026.v6n3.01

Keywords:

Band Gap, Semiconductors, Electric Field, Density Functional Theory, Monolayer Structures.

Abstract

In this study, the structural and electronic properties of monolayer SiSx (x = 1, 2) and the influence of external electric fields were systematically investigated using first-principles density functional theory (DFT) calculations. The computed results reveal that both monolayer SiS and SiS2 are indirect-gap semiconductors with band gaps of approximately 3.0 eV and 2.2 eV, respectively, as determined using the HSE06 hybrid functional. Notably, the application of an external electric field can effectively and continuously modulate the electronic band structure and band gap of both materials, demonstrating strong potential for field-tunable electronic and optoelectronic devices. These findings not only deepen our understanding of the fundamental electronic properties of SiS-based monolayers but also provide essential theoretical guidance for their exploitation in next-generation nanoelectronic and optoelectronic technologies.

References

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Published

01-07-2026

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Articles

How to Cite

[1]
V. K. Hung, D. T. L. Loan, and L. N. B. Bang, “First-Principles Investigation on the Impact of Electric Fields on the Electronic Properties of Monolayer SiS and SiS₂ for Nanoelectronic Applications”, Int. J. Multidiscip. Innovat. Res., vol. 6, no. 3, pp. 1–7, Jul. 2026, doi: 10.66566/ijmir/2026.v6n3.01.